MOCVD equipment is the key equipment for making LED epitaxial wafers, and the level of LED epitaxial wafers determines the level of the entire LED industry. In 2003, China officially implemented the “National Semiconductor Lighting Projectâ€, and in the “10th Five-Year Plan†and “Eleventh Five-Year Plan†key projects and the “863†plan, the localization of MOCVD equipment was included in the key support direction.
With the support of national policies, during the 10th Five-Year Plan period, China has achieved initial results in the localization of MOCVD equipment. The 48th Research Institute of China Electronics Technology Group Co., Ltd. has successfully developed GaN production MOCVD equipment (6×2′′) through measures such as digestion and absorption and innovation of key technologies, filling the domestic gap and making long-term restrictions on the development of China's LED industry. Equipment bottlenecks have been broken. At the same time, the Institute of Semiconductors of the Chinese Academy of Sciences, Nanchang University, Qingdao Jiesheng Electric and other units have successfully developed research-type MOCVD equipment.
There are still many ways to go for domestic MOCVD equipment.
Domestic MOCVD equipment still has the following problems:
(1) Domestic MOCVD equipment is still in the stage of technology tracking, and the level of equipment industrialization is not compatible with production needs. At present, the maximum capacity of domestically developed MOCVD equipment is 6 (48 GaN-MOCVD). However, as of December 2007, AIXTRON has introduced a 42-piece planetary reactor (AIX2800G4 HT) and a 30-piece CCS reactor (CRIUS) in the latest MOCVD equipment introduced abroad. Due to the gap in production capacity, the production cost of epitaxial wafers of small batches of MOCVD equipment is relatively high, which greatly reduces the cost performance of equipment, making domestic equipment just behind the development. The minimum requirement for a single batch of production capacity of a mass production enterprise is more than 30 pieces.
(2) The equipment cost is high and the application risk is high. Most manufacturers are more willing to purchase MOCVD equipment with mature technology. The cost of production MOCVD equipment is as high as RMB 10-20 million. Manufacturers are very cautious about the procurement of such equipment, and are more willing to purchase imported equipment with mature technology and perfect after-sales service, which makes the promotion of domestic MOCVD equipment in an awkward position.
(3) Independent innovation needs to be strengthened, domestic MOCVD equipment faces patent barriers Currently, the research and development of domestic MOCVD equipment is still in the stage of “digestion and absorptionâ€, while foreign mainstream commercial models have established strict patent protection, such as AIXTRON's Planetary Reactor reactor. The SAS (Close Coupled Showerhead Reactor) reactor of THOMAS SAWN, the Turbo Disk reactor of VEECO and the dual/multiple beam (TF) reactor of SANSO of Japan are all unique patent technologies. The domestic industrialization of MOCVD equipment faces patents. The test of barriers.
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